Recently, the 24th International Conference on Molecular Beam Epitaxy (ICMBE 2026) was held at the University of Michigan, Ann Arbor. Professor Yuefeng Nie from the School of Modern Engineering and Applied Sciences at Nanjing University was invited to deliver a plenary speech, titled "Exploring emergent phases in complex oxides via molecular beam epitaxy".
ICMBE is the oldest and most prestigious international conference in the field of molecular beam epitaxy, held biennially and bringing together leading researchers in MBE technology and materials science worldwide. At this conference, four distinguished scholars were invited as plenary speakers, including Professor Nie, alongside Professor Masataka Higashiwaki (Osaka Metropolitan University, Japan), Professor Huiyun Liu (University College London, UK), and Professor Maria Tamargo (City College of New York, USA). Invitation to deliver a plenary talk at this conference is a significant recognition of one's academic standing and impact.
In his talk, Professor Nie systematically presented his group's recent advances in complex oxide thin films using oxide molecular beam epitaxy (Oxide MBE). He highlighted the discovery of emergent phases and novel调控 effects in nickelate-based superconductors and barium titanate (BTO) ferroelectric thin films, achieved through atomic-scale precise growth and interface engineering. Representative accomplishments include the realization of ambient-pressure-stable nickelate superconducting thin films and wafer-scale heteroepitaxy of high-quality BTO thin films on silicon.
Source：https://icmbe2026.eecs.umich.edu/about/invited-speakers
